Description: The KJLC PVD 75 is a magnetron sputter deposition tool for depositing conductive metallic films under pressure control. Major technical characteristics: chamber volume is 75 liters; sampler holder - 30 cm in diameter; magnetron target size (diameter) 50.8 mm wit the deposition chimney; heating up to 350 ˚C; basic chamber pressure 2x10-7 Torr.

On-site training available: no
Qualified users only are permitted to operate this equipment: yes
Personal user assistant available: yes

Contact Scientist:

Dr. Tadas Ragaliauskas
+370 5 223 4401


27 2 Ragaliauskas Magnetroninio garinimo sistema 1

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