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Description: The KJLC PVD 75 is a magnetron sputter deposition tool for depositing conductive metallic films under pressure control. Major technical characteristics: chamber volume is 75 liters; sampler holder - 30 cm in diameter; magnetron target size (diameter) 50.8 mm wit the deposition chimney; heating up to 350 ˚C; basic chamber pressure 2x10-7 Torr.

https://www.lesker.com/newweb/vacuumsystems/depositionsystemspvdprolinepvd75.cfm

On-site training available: no
Qualified users only are permitted to operate this equipment: yes
Personal user assistant available: yes

VU ID:
Contact Scientist:

Dr. Tadas Ragaliauskas
+370 5 223 4401

 

27 2 Ragaliauskas Magnetroninio garinimo sistema 1

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