Description: The KJLC PVD 75 is a magnetron sputter deposition tool for depositing conductive metallic films under pressure control. Major technical characteristics: chamber volume is 75 litres; sampler holder - 30 cm in diameter; magnetron target size (diameter) 50.8 mm with the deposition chimney; heating up to 350 ˚C; basic chamber pressure 2x10^-7 Torr.

https://www.lesker.com/newweb/ped/physical-vapor-deposition-systems.cfm
https://www.lesker.com/newweb/vacuum_systems/deposition_systems_pvd_prolinepvd75.cfm

On-site training available: no
Qualified users only are permitted to operate this equipment: yes
Personal user assistant available: yes

VU ID: 8042984 -2
Room: C446
Dept.: LSC IBCh

Contact Scientist:

Dr Tadas Ragaliauskas
+370 5 223 4401